Study of Annealing Effect on the Some Physical Properties of Nanostructured TiO2 films prepared by PLD | ||
| Journal of College of Education | ||
| Article 1, Volume 0, Issue 3, September 2017, Pages 139-160 | ||
| Authors | ||
| Ali A.Yousif; Sarmad S. Al-Obaidi | ||
| Abstract | ||
| Nanostructured Titanium Dioxide (TiO2) thin films were prepared by pulsed laser deposition (PLD) on the glass substrates. The effects of different annealing temperature (400, 500 and 600 °C) towards the some physical properties such as structural, morphological and optical have been studied. From X-ray diffraction result, the crystallinity of TiO2 thin films improved at higher annealing temperature. It also could be observed that the rutile phase start to exist at annealing temperatures of 500 °C and 600 °C. The Full Width at Half Maximum (FWHM) of the (101) peaks of these films decreases from 0.450° to 0.301° with increasing of annealing temperature. AFM measurements confirmed that the films grown by this technique have good crystalline and homogeneous surface. The Root Mean Square (RMS) value of thin films surface roughness increased with increasing of the annealing temperature. From UV-VIS spectrophotometer measurements, the optical transmission results shows that the مجلة كلية التربية ............................................................. العدد الثالث 3102 140 transmission over than ~65% in the near-infrared region which decrease with the increasing of annealing temperatures. The allowed indirect optical band gap of the films was estimated to be in the range from 3.49 to 3.1 eV. The allowed direct band gap was found to decrease from 3.74 eV to 3.55 eV with the increase of annealing temperature. The refractive index of the films was found from 2.27 -2.98 at 550nm. The extinction coefficient, real and imaginary parts of the dielectric constant increase with annealing temperature. | ||
| Keywords | ||
| Titanium dioxide; Pulsed Laser Deposition; Structural; Morphology; Optical Properties; TiO | ||
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