Optical properties of TiO2 thin films prepared by reactive d.c. magnetron sputtering | ||
| Iraqi Journal of Physics | ||
| Article 1, Volume 10, Issue 18, August 2012, Pages 69-75 | ||
| Authors | ||
| Salah Al-Din M. AL-Dowaib; Izzat M. Al-Essa; Raad M. S. AL-Haddad | ||
| Abstract | ||
| TiO2 thin films were deposited by reactive d.c magnetron sputtering method on a glass substrate with various ratio of gas flow (Oxygen /Argon) (50/50, 100/50 and 150/50) at substrate temperature 573K. It can be observe that the optical energy gap of TiO2 thin films dependent on the ratio of gas flow (oxygen/argon), it varies between (3.45eV-3.57eV) also it is seen that the optical constants (α, n, K, εr and εi ) has been varied with the change of the ratio of gas flow (Oxygen /Argon). | ||
| Keywords | ||
| Optical properties; Reactive d; magnetron; TiO | ||
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