Effect of chemical treatment of silicon surface on solar cell ZnO/p-Si | ||
| Journal of Education and Science | ||
| Article 22, Volume 23, Issue 4, December 2010, Pages 101-114 PDF (0 K) | ||
| DOI: 10.33899/edusj.2010.58463 | ||
| Authors | ||
| Noor AbdulSalam Mustapha* ; Nawfal Yousif Jameel* | ||
| Abstract | ||
| Abstract In this work solar cells of (ZnO/p-Si) prepared by depositing ZnO thin films by electrochemical deposition method (using aqueous solution of ZnCl2 & KCl) on silicon(111) wafer samples. The samples then annealed at (550°C, 1h), to study the effects of annealing and chemical etching by (HCl, HF), optical microscope, SEM-EDAX, X-Ray used as analysis techniques. The optical properties of prepared ZnO on glass substrate also studied. An optical band gab of (3.15eV) calculated. The transmittance of 80% found for the sample before annealing where it became 85% after annealing. Solar cells conversion efficiency of 2.4% were obtained for the cells etched with HCl, where it was 4.337% for HF etching. Where for solar cells samples prepared under texture treatment gave an increase in the efficiency to the 4.7%. | ||
| Keywords | ||
| Chemical treatment; silicon surface; ZnO / p-Si; solar cell | ||
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