Influence of Deposition Condition on the Properties of Chemically Deposited Cu2O Film | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 28, Issue 19, September 2010, Pages 5881-5892 PDF (262.39 K) | ||
| DOI: 10.30684/etj.28.19.7 | ||
| Authors | ||
| Abdal-Satar Kuther; Ali M. Mousa | ||
| Abstract | ||
| Cuprous oxide films have been deposited by chemical bath method from alkaline solution at pH=8.6.The deposited oxides were investigated using X-ray diffraction, surface morphology, optical and electrical measurements. It is shown that during deposition two different stages could be distinguished. the band gap of the deposited film tuned from 2eV to 2.5 eV by decreasing deposition time. X-ray diffraction (XRD) measurements showed formation of CuO and Cu2O phases, the structure shows a thickness dependent. The grain size of as deposited and annealed films at different temperatures were calculated from SEM data, The results showed that the grain size of films increased with increasing deposition time and annealing temperature. The resistivity of the films had significantly decreased with increased deposition time, also films activation energy decreased with increasing thickness | ||
| Keywords | ||
| Cuprous oxide; CBD; ray diffraction; nano film | ||
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