Enhancement of Porous Silicon Formation by Using Ultrasonic Vibrations | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 30, Issue 5, March 2012, Pages 849-854 PDF (214.31 K) | ||
| DOI: 10.30684/etj.30.5.11 | ||
| Author | ||
| Ali H. Al-Hamdani | ||
| Abstract | ||
| Anodic electrochemical etching enhanced by ultrasonically is developed to fabricate luminescent porous silicon (PS) material. The samples prepared by the new etching method exhibit superior characteristics to those prepared by conventional direct current etching. By applying ultrasonically enhanced etching, PS microcavities with much higher quality factors can be fabricated. The improved quality induced by ultrasonic etching can be ascribed to increased rates of escape of hydrogen bubbles and other etched chemical species from the porous silicon pores surface. | ||
| Keywords | ||
| Ultrasonic; porous silicon; Electrochemical Etching; PS enhancement | ||
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