The Growth Characteristics of RF-Magnetron Sputtered Nanocrystalline TiO2 Thin Films | ||
| Engineering and Technology Journal | ||
| Article 6, Volume 36, 2B, December 2018, Pages 128-130 PDF (712.44 K) | ||
| DOI: 10.30684/etj.36.2B.6 | ||
| Authors | ||
| Azhar K. Sadkhan* 1; Suaad A. Mohammed2; Mohammed K. Khalaf3 | ||
| 1Office of the Vice President for Scientific Affairs and Post Graduate Studies, University of Technology Baghdad, Iraq. | ||
| 2Ministry of Education, Baghdad, Iraq. | ||
| 3Ministry of Science and Technology, Department of Materials Research, Baghdad, Iraq. | ||
| Abstract | ||
| In this paper, RF Magnetron sputtered TiO2 thin films deposited on glass slices at various powers (75,100,125 and 150) Watt for (1.5) hour and different thickness (62.5-88-118 and 132.6) nm, the TiO2 thin films annealed with 400°C for 2 hour and the morphology and structure of these films are described by X-ray diffraction XRD and atomic force microscopy AFM to show the phase structure. X-ray diffraction investigation uncovered that the crystalline size of the TiO2 thin films displays an expanding pattern with increasing the sputtering power. The preferred orientation of (101) was watched for the films deposited with sputtering power of (75,100,125 and 150) Watt. | ||
| Keywords | ||
| Titanium dioxide; Thin films; RF sputtering | ||
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