Effect of Laser Pulses on Characterization of Zincoxide Thin Film Prepared by PLD | ||
Engineering and Technology Journal | ||
Article 15, Volume 36, 1B, January 2018, Pages 93-98 PDF (746.57 K) | ||
DOI: 10.30684/etj.36.1B.15 | ||
Authors | ||
Suaad S. Shaker* 1; Asma H. Mohammed2; Majid S. Khalaf3 | ||
1Research Centre of Nanotechnology and Advanced Materials, University of Technology, Baghdad, Iraq | ||
2Department of Physics, Al Mustansyriah University, Baghdad, Iraq. | ||
3DNA Research Center, Al Nahrain University, Baghdad, Iraq. | ||
Abstract | ||
In this work, ZnO thin films have been deposition using pulsed laser deposition (PLD) method on glass and Si (111) substrates at different laser pulsed. Some properties of ZnO thin films were studied, the results of XRD explain Zinc oxidethin films with hexagonal wurtzite structure with thickness about 155and 200 nm. FTIR spectrum shows the existence of Zn – O bond that appear the texture of ZnOnanostructures. The root mean square of thin films were explained with the range 8.31–15.2 nm with particle size about 41.6 - 45.41and was only slightly dependent on number of laser pulses. Zinc oxide thin films showed transmittance of over 80% .The photovoltaic characteristics indicated an increase the short circuit current-open circuit voltage with illumination power as increased number of laser pulses resulted increasing of film thickness. | ||
Keywords | ||
Zinc oxide; pulsed laser deposition (PLD); laser pulses; polycrystalline | ||
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