J. Kadhim, F., A. Hammadi, O., K. Khalaf, M., T. Chiad, B. (2016). Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique. Alustath, 12(3), 27-34.
Firas J. Kadhim; Oday A. Hammadi; Mohammed K. Khalaf; Bahaa T. Chiad. "Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique". Alustath, 12, 3, 2016, 27-34.
J. Kadhim, F., A. Hammadi, O., K. Khalaf, M., T. Chiad, B. (2016). 'Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique', Alustath, 12(3), pp. 27-34.
J. Kadhim, F., A. Hammadi, O., K. Khalaf, M., T. Chiad, B. Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique. Alustath, 2016; 12(3): 27-34.

Preparation of Highly Pure Nanostructures by Reactive DC Magnetron Sputtering Technique

Iraqi Journal of Applied Physics
Article 1, Volume 12, Issue 3, September 2016, Pages 27-34
Authors
Firas J. Kadhim; Oday A. Hammadi; Mohammed K. Khalaf; Bahaa T. Chiad
Abstract
In this work, metal oxide and nitride nanostructures were prepared by reactive dc magnetron sputtering technique. These nanostructures were synthesized from metal oxide such as NiO and nitride such as Si3N4 for functional materials applications. The prepared nanostructures were diagnosed by x-ray diffraction (XRD) patterns and Fourier-transform infrared (FTIR) spectroscopy. The results showed that the prepared nanostructures are highly pure, which is ascribed to the featured characteristics of magnetron sputtering technique for such purposes.
Keywords
Magnetron sputtering; Nanostructures; Reactive sputtering; Film growth
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