Spectroscopic study for plasma parameters in co-sputtering system | ||
| Iraqi Journal of Physics | ||
| Article 1, Volume 14, Issue 31, December 2016, Pages 122-128 | ||
| Authors | ||
| Kadhim A. Aadim; Rabah A. H. Edan | ||
| Abstract | ||
| In this work the parameters of plasma (electron temperature Te, electron density ne, electron velocity and ion velocity) have been studied by using the spectrometer that collect the spectrum of plasma. Two cathodes were used (Si:Si) P-type and deposited on glass. In this research argon gas has been used at various values of pressures (0.5, 0.4, 0.3, and 0.2 torr) with constant deposition time 4hrs. The results of electron temperature were (31596.19, 31099.77, 26020.14 and 25372.64) kelvin, and electron density (7.60*1016, 8.16*1016, 6.82*1016 and 7.11*1016) m-3. Optical properties of Si were determined through the optical transmission method using ultraviolet visible spectrophotometer with in the range(300 – 1100) nm. | ||
| Keywords | ||
| Sputtering; OES; Spectroscopy diagnostic | ||
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