Preparation of NanostructureTiO2 at Different Temperatures by Pulsed Laser Deposition as Solar Cell | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 34, 2A, February 2016, Pages 193-204 PDF (791.74 K) | ||
| DOI: 10.30684/etj.2016.112609 | ||
| Authors | ||
| Amin Daway Thamir; Adawiya J. Haider; Ghalib A.Ali | ||
| Abstract | ||
| Deposition of the Titanium oxide (TiO2) particles on glass and the Si substrates was materialized for a wide range of temperatures (100-400)°C; using PLD technique at constant laser energy 800 mJ of frequency doubled Nd: YAG laser wavelength of 532nm running at 10 Hz rate and 10ns duration pulses. UV-Vis spectroscopy, Fourier Transform Infrared Spectroscopy (FTIR), X-ray diffraction (XRD), X-ray fluorescence (XRF), Scanning Electron Microscopy (SEM), Atomic Force Microscope(AFM), electrical conductivity (σdc), Hall coefficient (RH) and (I-V) and (C-V) measurements were employed to examine optical, morphological and electrical properties of the deposited films. 85% film transparency was accomplished with optical band gap of (3.25 – 3.64) eV.(I-V) characteristics showedan enhanced TiO2 p-n junction thin film solar cell efficiency by 1.6% at 400°C. | ||
| Keywords | ||
| switchedNd; Morphology; electrical properties; Nano; structure; TiO | ||
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