Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon | ||
| Engineering and Technology Journal | ||
| Article 9, Volume 32, 6B, June 2014, Pages 1106-1110 PDF (310.15 K) | ||
| DOI: 10.30684/etj.32.6B.9 | ||
| Authors | ||
| Uday Muhsin Nayef; Mohammed Waleed Muayad | ||
| Abstract | ||
| ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using porous silicon more than using glass and that's come from sponge like structure of porous silicon and large spastic area of porous silicon (about 500m2/cm3). | ||
| Keywords | ||
| porous silicon; ZnO films; XRD; AFM | ||
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