Preparation and Characterization of High Quality SnO2 Films Grown by (HPCVD) | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 32, 4B, April 2014, Pages 801-810 PDF (793.26 K) | ||
| DOI: 10.30684/etj.32.4B.20 | ||
| Authors | ||
| Baha T. Chiad; Nathera Ali; Nagam Th.Ali | ||
| Abstract | ||
| In this research SnO2 thin films have been prepared by using hot plate atmospheric pressure chemical vapor deposition (HPCVD) on glass and Si (n-type) substrates at various temperatures. Optical properties have been measured by UV-VIS spectrophotometer, maximum transmittance about (94%) at 400 0C. Structure properties have been studied by using X-ray diffraction (XRD) , its shows that all films have a crystalline structure in nature and by increasing growth temperature from(350-500) 0C diffraction peaks becomes sharper and grain size has been change. Atomic force microscopy (AFM) uses to analyze the morphology of the Tine Oxides surface structure. Roughness & Root mean square for different temperature have been investigated. The results show that both increase with substrate temperature increase this measurements deal with X-Ray diffraction results, that there is large change in the structure state of SnO2 thin f film by changing temperature parameter. | ||
| Keywords | ||
| Sno; Thin films; Hpcvd | ||
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