Influence of Deposition Temperature on Structure and Morphology of Nanostructured Sno2 Films Synthesized By Pulsed Laser Deposition (PLD) | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 32, 3B, March 2014, Pages 453-460 PDF (521.53 K) | ||
| DOI: 10.30684/etj.32.3B.8 | ||
| Authors | ||
| Suaad .S.Shaker; Adawiya J. Haider | ||
| Abstract | ||
| Nanostructured Tin oxide thin films were deposited on the Si (111) substrate using pulsed laser deposition technique at different substrate temperatures (200, 300,400 and 500 °C) in an oxygen pressure (5*10-1 mbar). The structure and morphology of the as-deposited films indicate that the film crystallinity and surface topography are influenced by the deposition temperature by changing from an almost amorphous to crystalline nanostructure and rougher topography at a higher substrate temperature. Hall Effect has been studied to estimate the type of carriers, from the result we deduced that the SnO2 thin films are n-type. | ||
| Keywords | ||
| Pulsed laser deposition; Sno; Nonstructural | ||
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