Characteristics Study of ZnO Thin Films by Rapid Thermal Oxidation Treatment Technique | ||
| Engineering and Technology Journal | ||
| Article 1, Volume 33, 1B, January 2015, Pages 37-44 PDF (510.7 K) | ||
| DOI: 10.30684/etj.33.1B.4 | ||
| Authors | ||
| Uday Muhsin Nayef; Mohammed Jamal Jasim | ||
| Abstract | ||
| In this paper preparation of good quality transparent conductive ZnO thin films by post-oxidation of vacuum evaporated Zn, on glass and silicon (p-type) as substrates, the oxidation was achieved in a short time (90 sec) which is known as rapid thermal oxidation. One growth parameter has been considered to specify the optimum conditions the film thickness are (200,300,400 &500 nm). The XRD spectra revealed a high oriented grain in the (002) lattice system which is hexagonal wurtzite and proved that the ZnO films have a polycrystalline structure. Also, the morphological properties of ZnO films show that all films have a homogeneous surface morphology and it appears, to change significantly as a function of thickness.The energy gap of ZnO films decreases as the thickness increases. The FTIR spectra indicate the existence of the distinct characteristic absorption peak at 472.56cm-1 for Zn-O stretching mode. Study of effect I-V and C-V measurements of ZnO films with the increase thickness. The photovoltaic properties confirmed that the photovoltaic depends strongly on the bias voltage and the amount of current produced by a photovoltaic device which is directly related to the number of photons absorbed. C-V results demonstrated that the fabricated heterojunction is of abrupt type. Also, the width of the depletion layer (w) follows the same behavior (V_bi ) decreased while the charge carrier density (N_d ) was increased with the thickness increase. | ||
| Keywords | ||
| ZnO; thin film; XRD; FTIR; morphological; Electrical properties | ||
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